JPH04380B2 - - Google Patents
Info
- Publication number
- JPH04380B2 JPH04380B2 JP57005703A JP570382A JPH04380B2 JP H04380 B2 JPH04380 B2 JP H04380B2 JP 57005703 A JP57005703 A JP 57005703A JP 570382 A JP570382 A JP 570382A JP H04380 B2 JPH04380 B2 JP H04380B2
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- single crystal
- center
- present
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/04—Pattern deposit, e.g. by using masks
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Recrystallisation Techniques (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP570382A JPS58123717A (ja) | 1982-01-18 | 1982-01-18 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP570382A JPS58123717A (ja) | 1982-01-18 | 1982-01-18 | 半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58123717A JPS58123717A (ja) | 1983-07-23 |
JPH04380B2 true JPH04380B2 (en]) | 1992-01-07 |
Family
ID=11618467
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP570382A Granted JPS58123717A (ja) | 1982-01-18 | 1982-01-18 | 半導体装置の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58123717A (en]) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60152019A (ja) * | 1984-01-20 | 1985-08-10 | Agency Of Ind Science & Technol | 電子ビームアニール方法 |
JPS62245619A (ja) * | 1986-04-17 | 1987-10-26 | Nec Corp | 電子ビ−ムアニ−ル装置 |
JPH0793264B2 (ja) * | 1987-08-21 | 1995-10-09 | 工業技術院長 | 半導体単結晶層の製造方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS528672A (en) * | 1975-07-09 | 1977-01-22 | Jidosha Seiki Kogyo Kk | Car washing device |
-
1982
- 1982-01-18 JP JP570382A patent/JPS58123717A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS58123717A (ja) | 1983-07-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US3336159A (en) | Method for growing single thin film crystals | |
JPH04380B2 (en]) | ||
JPS5856406A (ja) | 半導体膜の製造方法 | |
JPS5886717A (ja) | 単結晶シリコン膜形成法 | |
GB2112205A (en) | A thermal processing system for semiconductors and other materials using two or more electron beams | |
JPH0136972B2 (en]) | ||
JPH02140916A (ja) | 薄膜トランジスタの製造方法 | |
JPS58139423A (ja) | ラテラルエピタキシヤル成長法 | |
JP2695462B2 (ja) | 結晶性半導体膜及びその形成方法 | |
JPH0235451B2 (en]) | ||
JPH0371767B2 (en]) | ||
JPS5856457A (ja) | 半導体装置の製造方法 | |
JPH0732121B2 (ja) | 半導体装置の製造方法 | |
JPS61187222A (ja) | 半導体単結晶層の製造方法 | |
JPH0136970B2 (en]) | ||
JPS6320011B2 (en]) | ||
JPS60191090A (ja) | 半導体装置の製造方法 | |
JPH01297814A (ja) | 単結晶薄膜の製造方法 | |
JPS6054426A (ja) | 半導体素子の製造方法 | |
JPH0354849B2 (en]) | ||
JPS5934640A (ja) | 絶縁物質上の半導体膜の粗大結晶粒化乃至単結晶化法 | |
JPH02101735A (ja) | 半導体単結晶層の製造方法 | |
JPH0334847B2 (en]) | ||
JPS60191089A (ja) | 単結晶薄膜の製造方法 | |
JPS5860530A (ja) | 半導体膜の製造方法 |